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Proceedings Paper

UV doses and skin effects during psoriasis climate therapy
Author(s): Lise L. Randeberg; Julio Hernandez-Palacios; Mila Lilleeng; Lill Tove Nilsen; Anne-Lene Krogstad
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Paper Abstract

Psoriasis is a common autoimmune disease with inflammatory symptoms affecting skin and joints. One way of dealing with psoriasis is by controlled solar UV exposure treatment. However, this treatment should be optimized to get the best possible treatment effect and to limit negative side effects such as erythema and an increased risk of skin cancer. In this study 24 patients at Valle Marina Treatment Center in Gran Canaria were monitored throughout a treatment period of three weeks starting at the beginning of November. The total UV dose to the location was monitored by UV-meters placed on the roof of the treatment centere, and the patients wore individual film dosimeters throughout the treatment period. Skin parameters were accessed by reflection spectroscopy (400-850nm). This paper presents preliminary findings from the skin measurements in the visible part of the spectrum, such as blood oxygenation, erythema and melanin indexes. Reflection spectroscopy was found to be a good tool for such treatment monitoring.

Paper Details

Date Published: 18 February 2011
PDF: 8 pages
Proc. SPIE 7883, Photonic Therapeutics and Diagnostics VII, 788307 (18 February 2011); doi: 10.1117/12.874067
Show Author Affiliations
Lise L. Randeberg, Norwegian Univ. of Science and Technology (Norway)
Julio Hernandez-Palacios, Univ. of Oslo (Norway)
Mila Lilleeng, Rikshospitalet Univ. Hospital (Norway)
Lill Tove Nilsen, Norwegian Radiation Protection Authority (Norway)
Anne-Lene Krogstad, Rikshospitalet Univ. Hospital (Norway)


Published in SPIE Proceedings Vol. 7883:
Photonic Therapeutics and Diagnostics VII
Kenton W. Gregory; Nikiforos Kollias; Andreas Mandelis; Henry Hirschberg; Hyun Wook Kang; Anita Mahadevan-Jansen; Brian Jet-Fei Wong; Justus F. R. Ilgner; Bodo E. Knudsen; E. Duco Jansen; Steen J. Madsen; Guillermo J. Tearney; Bernard Choi; Haishan Zeng; Laura Marcu, Editor(s)

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