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Proceedings Paper

Fabrication of optical filters using multilayered porous silicon
Author(s): Noha Gaber; Diaa Khalil; Amr Shaarawi
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Paper Abstract

In this work we describe a method for fabricating optical filters using multilayered porous silicon 1D photonic structure. An electrochemical cell is constructed to control the porosity of variable layers in p-type Si wafers. Porous silicon multilayered structures are formed of λ/4 (or multiples) thin films that construct optical interference filters. By changing the anodizing current density of the cell during fabrication, different porosities can be obtained as the optical refractive index is a direct function of the layer porosity. To determine the morphology, the wavelength dependent refractive index n and absorption coefficient α, first, porous silicon free standing mono-layers have been fabricated at different conditions and characterized in the near infrared region (from 1000 to 2500nm). Large difference in refractive index (between 1.6 and 2.6) is obtained. Subsequently, multilayer structures have been fabricated and tested. Their spectral response has been measured and it shows good agreement with numerical simulations. A technique based on inserting etching breaks is adopted to ensure the depth homogeneity. The effect of differing etching/break times on the reproducibility of the filters is studied.

Paper Details

Date Published: 14 February 2011
PDF: 9 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270S (14 February 2011); doi: 10.1117/12.873615
Show Author Affiliations
Noha Gaber, The American Univ. in Cairo (Egypt)
Diaa Khalil, Ain Shams Univ. (Egypt)
Amr Shaarawi, The American Univ. in Cairo (Egypt)


Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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