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Proceedings Paper

Variation of refractive index step of 635nm ridge waveguide lasers for optimized index guiding
Author(s): D. Feise; G. Blume; Chr. Kaspari; K. Paschke; G. Erbert
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Paper Abstract

We report on experimental and theoretical investigations concerning the influence of the ridge etching depth and the corresponding effective refractive index step on the electro-optical properties of ridge waveguide diode lasers emitting near 635 nm. We observe a suppression of higher order lateral modes for larger steps in effective index leading to a more homogeneous far field, as required e.g. in "flying spot" display applications. With the proper design choice, a total optical output power of P > 200 mW at 638 nm and 15°C and a beam quality M² < 2 could be achieved.

Paper Details

Date Published: 21 February 2011
PDF: 9 pages
Proc. SPIE 7918, High-Power Diode Laser Technology and Applications IX, 791812 (21 February 2011); doi: 10.1117/12.873397
Show Author Affiliations
D. Feise, Leibniz-Institut für Höchstfrequenztechnik (Germany)
G. Blume, Leibniz-Institut für Höchstfrequenztechnik (Germany)
Chr. Kaspari, Leibniz-Institut für Höchstfrequenztechnik (Germany)
K. Paschke, Leibniz-Institut für Höchstfrequenztechnik (Germany)
G. Erbert, Leibniz-Institut für Höchstfrequenztechnik (Germany)

Published in SPIE Proceedings Vol. 7918:
High-Power Diode Laser Technology and Applications IX
Mark S. Zediker, Editor(s)

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