Share Email Print

Proceedings Paper

Research of optical imaging system for integral stereolithography system
Author(s): Guangshen Xu; Jian Yang; Jing Jin; Sheng Luo
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The development of integral SL system with low cost for fabrication small size object has important significance, and dynamic pattern generator is the key component for a integral SL system. To set up the dynamic pattern generator using digital micro-mirror device (DMD), an optical imaging system, which produces Section pattern of a object on working plane and solidifies photo curable resin, has been designed. The optical imaging system consists of two components. The component 1 is made up of 3 positive lenses, and the component 2 consists of a negative lens, two positive lenses and a aperture. To reduce the coma and astigmatism of the image produced with the optical imaging system, the aperture position is optimized with soft ZEMAX. The best location for the stop is 1 mm before the second lens in component 2. As a result, the coma is 3.7 wavelengths, and astigmatism is -0.18 wavelengths. The design of the optical imaging system lays a foundation for set-up low-cost integral SL system.

Paper Details

Date Published: 21 July 2010
PDF: 5 pages
Proc. SPIE 7749, 2010 International Conference on Display and Photonics, 774915 (21 July 2010); doi: 10.1117/12.871542
Show Author Affiliations
Guangshen Xu, Xi'an Polytechnic Univ. (China)
Jian Yang, Xi'an Polytechnic Univ. (China)
Jing Jin, Xi'an Polytechnic Univ. (China)
Sheng Luo, Xi'an Polytechnic Univ. (China)

Published in SPIE Proceedings Vol. 7749:
2010 International Conference on Display and Photonics

© SPIE. Terms of Use
Back to Top