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Proceedings Paper

Evolution of illumination systems in microlithography: a retrospective
Author(s): Alois M. Herkommer
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Paper Abstract

Illumination systems in microlithography have evolved from simple light mixing devices towards ultra-flexible contrast enhancement tools, enabling today's most advanced lithographic processes. A survey of the changing illumination requirements, design concepts and functionality is given.

Paper Details

Date Published: 8 September 2010
PDF: 6 pages
Proc. SPIE 7652, International Optical Design Conference 2010, 76520X (8 September 2010); doi: 10.1117/12.870738
Show Author Affiliations
Alois M. Herkommer, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 7652:
International Optical Design Conference 2010
Julie Bentley; Anurag Gupta; Richard N. Youngworth, Editor(s)

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