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Proceedings Paper

Characteristics of subwavelength photolithography based on surface plasmon polaritons
Author(s): Weihao Ge; Yinfei Xue; Chinhua Wang; Bing Cao
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Paper Abstract

In this work, the characteristics of the subwavelength patterning through periodic metal gratings are discussed. By incorporating different structures of metal gratings, the quality improvements in subwavelength pattern generation are observed in terms of pattern resolution, uniformity and visibility. By using Ag and Al metals, a deep subwavelength (~λ/12 and ~λ/9) pattern with sufficient visibility, and high uniformity can be achieved. The physical mechanism of the quality improvements based on surface-plasmon polaritons (SPPs) theory is discussed. Finite-difference time-domain analysis method is used in the simulation.

Paper Details

Date Published: 17 November 2010
PDF: 8 pages
Proc. SPIE 7848, Holography, Diffractive Optics, and Applications IV, 78482O (17 November 2010); doi: 10.1117/12.870345
Show Author Affiliations
Weihao Ge, Soochow Univ. (China)
Yinfei Xue, Soochow Univ. (China)
Chinhua Wang, Soochow Univ. (China)
Bing Cao, Soochow Univ. (China)

Published in SPIE Proceedings Vol. 7848:
Holography, Diffractive Optics, and Applications IV
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)

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