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Proceedings Paper

The effect of 630-nm light stimulation on the sEMG signal of forearm muscle
Author(s): Dan D. Yang; W. Sheng Hou; Xiao Y. Wu; Xiao L. Zheng; Jun Zheng; Ying T. Jiang
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Paper Abstract

This study aimed to explore if the red light irradiation can affect the electrophysiology performance of flexor digitorum superficialis (FDS) and fatigue recovery. Four healthy volunteers were randomly divided into two groups. In the designed force-tracking tasks, all subjects performed the four fingertip isometric force production except thumb with a load of 30% of the maximum voluntary contraction (MVC) force until exhaustion. Subsequently, for the red light group, red light irradiation (640 nm wavelength, 0.23J/cm2, 20 min) was used on the right forearm; for the control group, the subjects relaxed without red light irradiation. Then subjects were required to perform fatigue trail again, and sEMG signal was collected simultaneously from FDS during finger force production. Average rectified value (ARV) and median frequency (MF) of sEMG were calculated. Compared to the control group, the red light irradiation induced more smoother value of ARV between 30% and 40%, and the value of MF was obviously large and smooth. The above electrophysiological markers indicated that recovery from muscle fatigue may be positively affected by the red light irradiation, suggesting that sEMG would become a power tool for exploring the effect of red light irradiation on local muscle fatigue.

Paper Details

Date Published: 8 November 2010
PDF: 8 pages
Proc. SPIE 7845, Optics in Health Care and Biomedical Optics IV, 784510 (8 November 2010); doi: 10.1117/12.870298
Show Author Affiliations
Dan D. Yang, Chongqing Univ. (China)
W. Sheng Hou, Chongqing Univ. (China)
Xiao Y. Wu, Chongqing Univ. (China)
Xiao L. Zheng, Chongqing Univ. (China)
Jun Zheng, New Mexico Institute of Mining and Technology (United States)
Ying T. Jiang, Univ. of Nevada, Las Vegas (United States)


Published in SPIE Proceedings Vol. 7845:
Optics in Health Care and Biomedical Optics IV
Qingming Luo; Ying Gu; Xingde Li, Editor(s)

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