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Proceedings Paper

Projection photolithography method for fabricating continuous surface structure with aperture less than 10 um
Author(s): Lifang Shi; Weiguo Zhang; Xiaochun Dong; Yutang Ye; Chunlei Du
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Paper Abstract

A projection photolithography method is presented in the paper, which can be used for fabricating continuous surface structure with the aperture of a few micrometers. In the method, a microlens array is used to form minified images of a designed object. When the parameters of the microlens and the object are properly determined, images with minification from hundreds to thousands times can be obtained. Photoresist is used to record the images and patterns with micro or sub-micro critical size could be manufactured. Both geometric and diffraction theory are used for optimizing the parameters and the design process is given. Resist reflow method is used in our experiment for achieving microlens array with the characteristics of a large NA and a small period. The micro-taper array with period 20 μm and aperture of 5 μm was manufactured with the method and the home made microlens array photolithographic system.

Paper Details

Date Published: 16 November 2010
PDF: 6 pages
Proc. SPIE 7848, Holography, Diffractive Optics, and Applications IV, 78480T (16 November 2010); doi: 10.1117/12.869473
Show Author Affiliations
Lifang Shi, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Weiguo Zhang, Institute of Optics and Electronics (China)
Southwest Institute of Applied Magnetics (China)
Xiaochun Dong, Institute of Optics and Electronics (China)
Yutang Ye, Univ. of Electronic Science and Technology of China (China)
Chunlei Du, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7848:
Holography, Diffractive Optics, and Applications IV
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)

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