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Proceedings Paper

Challenges for quality 15nm groove patterning with ZEP520A for a master fabrication for track pitch 50nm full-surface DTR-Media
Author(s): Hiromasa Iyama; Kazuhiro Hamamoto; Shuji Kishimoto; Masasuke Nakano; Takeshi Kagatsume; Takashi Sato; Hideo Kobayashi; Tsuyoshi Watanabe
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Paper Abstract

Discrete Track Recording Media (DTR-Media) requires 50nm track pitch patterns and a mold as the start for 1 Tb/inch2 areal density, which is a quality 15nm groove (trench) and beyond. Last year, 14nm groove was achieved with a newly designed solvent developer for ZEP520A, we reported in PMJ 2009. But, we still need to pursue extreme high resolution such as 10nm groove or 12.5nm dot array for bit patterns with ZEP520A since no alternative was found so far. To improve ZEP520 resolution, we just keep trying to find a new developer with a lower development speed for ZEP520 than the previous one. Then, a Fluoro-Carbon was selected from various candidates. It was proved that ZEP520 and the Fluoro-Carbon developer provided 11nm groove resolution at an exposure dose of 1800μC/cm2. Furthermore, the mixture of the Fluoro-Carbon and Solvent B provided the same 11nm groove resolution at a higher sensitive, i.e. less exposure dose than the Fluoro-Carbon and even the Solvent B.

Paper Details

Date Published: 28 May 2010
PDF: 5 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481Z (28 May 2010); doi: 10.1117/12.869098
Show Author Affiliations
Hiromasa Iyama, HOYA Corp. (Japan)
Kazuhiro Hamamoto, HOYA Corp. (Japan)
Shuji Kishimoto, HOYA Corp. (Japan)
Masasuke Nakano, HOYA Corp. (Japan)
Takeshi Kagatsume, HOYA Corp. (Japan)
Takashi Sato, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Tsuyoshi Watanabe, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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