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Proceedings Paper

Deep-etched fused silica gratings and applications
Author(s): Changhe Zhou
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Paper Abstract

Deep-etched fused silica grating is a kind of high density phase gratings whose surface are etched into an optimized depth for achieving a series of novel functions, such as high efficient diffraction at the -1 order, polarizing beam splitting, 1x2, 1x3 beam splitting, etc.. Since deep-etched fused silica grating is made of pure dielectric material of fused silica, so it has a high laser damage threshold for high power laser applications. We fabricated the polarizing beam splitter of the fused silica grating and realized the even and odd modes for analysis of fused silica grating. We gave the generalized equations for describing the performance of polarizing beam splitting and high efficient diffraction at the -1 order. We gave the analytic equation of 1x3 diffraction, which is impossible to obtain with the previous rigorously coupled wave method. For fabrication of deep-etched fused silica gratings, holographic recording, lithographic technique, and inductively coupled plasma etching are used to make the deep-etched gratings. Deep-etched gratings have a variety of practical applications. It can be used for demultiplexing optical signals in DWDM optical fiber communications. It can also be used as a pulse compressor of femtosecond or picosecond laser pulses. It can also be used as polarizing beam splitter, high efficient diffraction for spectrometer, etc.. Deep-etched fused silica gratings have a bright future for practical applications.

Paper Details

Date Published: 5 November 2010
PDF: 7 pages
Proc. SPIE 7848, Holography, Diffractive Optics, and Applications IV, 78480R (5 November 2010); doi: 10.1117/12.869033
Show Author Affiliations
Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 7848:
Holography, Diffractive Optics, and Applications IV
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)

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