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Proceedings Paper

Photomask Japan 2010 panel discussion overview
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Paper Abstract

Photomask Japan each year hosts a meeting inviting the conference attendees to actively participate in a discussion on a selected topic. The topic selected for this year is on new mask inspection and metrology techniques that are just emerging in the market, namely, aerial/wafer image based inspection and metrology, and optical high sampling frequency CD uniformity measurement. The panel discussion hopes to identify potential values of each technique and at the same time discover any challenge if the industry were to adopt such technique.

Paper Details

Date Published: 24 September 2010
PDF: 6 pages
Proc. SPIE 7823, Photomask Technology 2010, 782306 (24 September 2010); doi: 10.1117/12.868534
Show Author Affiliations
Yoshinori Nagaoka, KLA-Tencor Japan Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Shinji Akima, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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