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Proceedings Paper

Toward the global optimum in lithographic lens design
Author(s): Aurelian Dodoc
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Paper Abstract

Significant advances have been made in recent years in the development of lithography optics. The resolution of structures smaller than 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best-performing lens types and design principles of the catadioptric concept of these lenses.

Paper Details

Date Published: 9 September 2010
PDF: 10 pages
Proc. SPIE 7652, International Optical Design Conference 2010, 76522B (9 September 2010); doi: 10.1117/12.868530
Show Author Affiliations
Aurelian Dodoc, Carl Zeiss AG (Germany)

Published in SPIE Proceedings Vol. 7652:
International Optical Design Conference 2010
Julie Bentley; Anurag Gupta; Richard N. Youngworth, Editor(s)

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