Share Email Print
cover

Proceedings Paper

Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

As semiconductor features shrink in size and pitch, there are strong needs for an advanced mask writer which has better patterning quality. Among various requirements for next photomask writer, we have focused on the requirements of ebeam size and position accuracy for hp 32nm and beyond generation. At the era of DPT, EUV, and complex OPC, the photomask is required to have extreme control of critical dimension (CD). Based on simulation and experiment, we present the e-beam requirements for advanced mask writer, in view point of stability and accuracy. In detail, the control of e-beam size in mask writer should be decreased to 0.5nm because the size error of e-beam gives rise to large CD error according to the high complexity of mask pattern. Furthermore, the drift error of beam position should be smaller than 1nm to obtain the tight pattern placement error and to minimize the edge roughness of mask pattern for the era of computational lithography and EUV lithography.

Paper Details

Date Published: 26 May 2010
PDF: 12 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 774819 (26 May 2010); doi: 10.1117/12.868174
Show Author Affiliations
Jin Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sang Hee Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hee Bom Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sang-Gyun Woo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Han Ku Cho, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top