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Proceedings Paper

Computational lithography and inspection (CLI) and its applications in mask inspection, metrology, review, and repair
Author(s): Linyong Pang; Danping Peng; Lin He; Dongxue Chen; Vikram Tolani
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Paper Abstract

At the most advanced technology nodes, such as 32nm, 22nm, and beyond, aggressive OPC and Sub-Resolution Assist Features (SRAFs) on the mask are essential for accurate on-wafer imaging; mask patterns generated by Inverse Lithography Technology (ILT) and Source Mask Optimization (SMO) may also be necessary for production. However, their use results in significantly increased mask complexity, making mask defect disposition more challenging than ever. Computational Lithography and Inspection (CLI) have broad applications in mask inspection, metrology, review, and repair, and provide additional information to assist the operator in making accurate and efficient decisions on defect disposition. In this paper these applications of CLI in mask inspection, off-line review, metrology, and repair are presented and discussed.

Paper Details

Date Published: 29 September 2010
PDF: 18 pages
Proc. SPIE 7823, Photomask Technology 2010, 78232H (29 September 2010); doi: 10.1117/12.868034
Show Author Affiliations
Linyong Pang, Luminescent Technologies, Inc. (United States)
Danping Peng, Luminescent Technologies, Inc. (United States)
Lin He, Luminescent Technologies, Inc. (United States)
Dongxue Chen, Luminescent Technologies, Inc. (United States)
Vikram Tolani, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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