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Proceedings Paper

Generalization of shot definition for variable shaped e-beam machines for write time reduction
Author(s): Emile Sahouria; Amanda Bowhill
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Paper Abstract

We propose a new aperture stage for shaped e-beam exposure tools. This aperture stage is able to print an "L" shape in a single exposure shot. The aperture may be used in mask- and wafer-patterning e-beam tools. The physical and mechanical nature of the aperture appears to be fundamentally similar to existing apertures that form rectangular shapes, yet it reduces the required shot count for exposure by as much as half.

Paper Details

Date Published: 24 September 2010
PDF: 6 pages
Proc. SPIE 7823, Photomask Technology 2010, 78230T (24 September 2010); doi: 10.1117/12.867994
Show Author Affiliations
Emile Sahouria, Mentor Graphics Corp. (United States)
Amanda Bowhill, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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