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Proceedings Paper

The mode characteristics of photonic crystal vertical cavity surface emitting laser
Author(s): Yi Yang Xie; Chen Xu; Qiang Kan; Chun Xia Wang; Bao Qiang Wang; Ying Ming Liu; Hong Da Chen; Guang Di Shen
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Paper Abstract

In this paper, we report the single mode operation of PC-VCSEL. The PC- VCSEL is similar to standard VCSEL except that it has photonic crystal defined by holes in the top distributed Bragg reflector. The two-dimensional photonic crystal (2-D PhC) structure is applied to lateral mode control of VCSEL. The optical confinement in VCSEL is realized by adding air-holes in the top (DBR). The holes are arranged periodically such that they form a triangular or square symmetric pattern. Light emitting aperture is formed by removing some air holes centered at photonic crystal pattern. By adjusting the photonic crystal parameters and air-holes depth, a variety of optical mode characteristic can be achieved. The characteristics of lasing lateral modes in PhC-VCSEL were analyzed by etching depth related effective index method. The contribution of PhC parameters such as lattice constant a, holes diameter d and uniform material index n to lateral mode characteristic is investigated systematically. Then two dimensional PhC was fabricated using electron beam lithography (EBL) and inductive coupled plasma reactive ion etching (ICP-RIE) on the surface of the VCSEL's top DBR. A single-fundamental- mode output power bigger than 1mW, threshold current below 5 mA, Full Width Half Maximum (FWHM) of lasing spectrum is less than 0.06 nm and over 30dB SMSR PhC-VCSEL was obtained. The lateral mode characteristics affected by different current injection was also considered.

Paper Details

Date Published: 22 October 2010
PDF: 7 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76570H (22 October 2010); doi: 10.1117/12.867912
Show Author Affiliations
Yi Yang Xie, Beijing Univ. of Technology (China)
Institute of Semiconductors (China)
Chen Xu, Beijing Univ. of Technology (China)
Qiang Kan, Institute of Semiconductors (China)
Chun Xia Wang, Institute of Semiconductors (China)
Bao Qiang Wang, Beijing Univ. of Technology (China)
Ying Ming Liu, Beijing Univ. of Technology (China)
Hong Da Chen, Institute of Semiconductors (China)
Guang Di Shen, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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