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Proceedings Paper

Defect inspection and repair performance comparisons between EUV and conventional masks
Author(s): Kazunori Seki; Masafumi Shibita; Takashi Yoshii; Tsukasa Fujimoto; Yo Sakata; Shinji Akima
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Paper Abstract

Two types of blanks, EUV A and EUV B, are the leading EUV blanks contenders. They are evaluated and compared with OMOG blank for their suitability as a photomask blanks. For defect inspection evaluation, contrast for pattern image and sensitivity for detection were evaluated using the newly developed inspection tools. With these tools, it is learnt that the sensitivity varies according to a set of conditions. For repair performance evaluations, EUV mask was assessed through E-beam repair tools, those that are most widely used. The results on both types of masks demonstrate good repair shape that is almost same quality as repair on OMOG mask. Moreover, under the two types of repair conditions used in this study, no degradation on pattern was found for the optimized condition as result of repair work.

Paper Details

Date Published: 26 May 2010
PDF: 10 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 774807 (26 May 2010); doi: 10.1117/12.867754
Show Author Affiliations
Kazunori Seki, Toppan Printing Co., Ltd. (Japan)
Masafumi Shibita, Toppan Printing Co., Ltd. (Japan)
Takashi Yoshii, Toppan Printing Co., Ltd. (Japan)
Tsukasa Fujimoto, Toppan Printing Co., Ltd. (Japan)
Yo Sakata, Toppan Printing Co., Ltd. (Japan)
Shinji Akima, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

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