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Proceedings Paper

Influence of spatial temperature distribution on high accuracy interferometric metrology
Author(s): Yongqiang Gu; Erlong Miao
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Paper Abstract

We calculate the influence of temperature change on the refractive index of air, establish a model of air temperature distribution and analyze the effect of different temperature distribution on the high accuracy interferometric metrology. First, a revised Edlen formula is employed to acquire the relation between temperature and refractive index of air, followed by introducing the fixed temperature gradient distribution among the spatial grid within the optical cavity between the reference flat and the test flat of the Fizeau interferometer, accompanied by a temperature change random function within each grid. Finally, all the rays through the air layer with different incident angles are traced by Matlab program in order to obtain the final output position, angle and OPD for each ray. The influence of different temperature distribution and the length of the optical cavity in on the testing accuracy can be analyzed through the RMS value that results from repeatable rays tracing. As a result, the horizontal distribution (vertical to optical axis) has a large effect on the testing accuracy. Thus, to realize the high accuracy figure metrology, the horizontal distribution of temperature must be rigorously controlled as well as to shorten the length of the optical cavity to a large extent. The results from our simulation are of great significant for the accuracy analysis of interferometric testing and the research of manufacturing a interferometer.

Paper Details

Date Published: 12 October 2010
PDF: 6 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765647 (12 October 2010); doi: 10.1117/12.867751
Show Author Affiliations
Yongqiang Gu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of Chinese Academy of Sciences (China)
Erlong Miao, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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