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Proceedings Paper

Comparing the use of 4.6 μm lasers versus 10.6 μm lasers for mitigating damage site growth on fused silica surfaces
Author(s): Steven T. Yang; Manyalibo J. Matthews; Selim Elhadj; Diane Cooke; Gabriel M. Guss; Vaughn G. Draggoo; Paul J. Wegner
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Paper Abstract

The advantage of using mid-infrared (IR) 4.6 μm lasers, versus far-infrared 10.6 μm lasers, for mitigating damage growth on fused silica is investigated. In contrast to fused silica's high absorption at 10.6 μm, silica absorption at 4.6 μm is two orders of magnitude less. The much reduced absorption at 4.6 μm enables deep heat penetration into fused silica when it is heated using the mid-IR laser, which in turn leads to more effective mitigation of damage sites with deep cracks. The advantage of using mid-IR versus far-IR laser for damage growth mitigation under non-evaporative condition is quantified by defining a figure of merit (FOM) that relates the crack healing depth to laser power required. Based on our FOM, we show that for damage cracks up to at least 500 μm in depth, mitigation using a 4.6 μm mid-IR laser is more efficient than mitigation using a 10.6 μm far-IR laser.

Paper Details

Date Published: 2 December 2010
PDF: 8 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784219 (2 December 2010); doi: 10.1117/12.867747
Show Author Affiliations
Steven T. Yang, Lawrence Livermore National Lab. (United States)
Manyalibo J. Matthews, Lawrence Livermore National Lab. (United States)
Selim Elhadj, Lawrence Livermore National Lab. (United States)
Diane Cooke, Lawrence Livermore National Lab. (United States)
Gabriel M. Guss, Lawrence Livermore National Lab. (United States)
Vaughn G. Draggoo, Lawrence Livermore National Lab. (United States)
Paul J. Wegner, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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