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Proceedings Paper

Mask shop automation: station controllers for photomask manufacturing
Author(s): Derek Lager; Venkatesh Nadamuni
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Paper Abstract

Station Controllers have existed in Wafer FABs for well over a decade now. Until recently, relatively low volume of masks produced did not justify the added cost of enabling SECS/GEM on the tools and implementing full automation. Starting with a drive to improve yield and the need for advanced capabilities such as Excursion Protection, a combination of recent factors has driven the need for greater automation. This paper will discuss key capabilities, architectural highlights and strategies in implementation. In addition we will discuss the challenges faced and key learning in development and validation of the station controllers in a full production environment with minimum impact or interruption to the processing of WIP.

Paper Details

Date Published: 24 September 2010
PDF: 12 pages
Proc. SPIE 7823, Photomask Technology 2010, 78231X (24 September 2010); doi: 10.1117/12.867687
Show Author Affiliations
Derek Lager, Intel Corp. (United States)
Venkatesh Nadamuni, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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