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Proceedings Paper

Statistical approach to specify DPT process in terms of patterning and electrical performance of sub-30nm DRAM device
Author(s): Yu-Jin Pyo; Soo-Han Choi
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Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481K; doi: 10.1117/12.867595
Show Author Affiliations
Yu-Jin Pyo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Soo-Han Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII

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