Share Email Print
cover

Proceedings Paper

Nano-patterns fabricated by soft press and temperature-pressure variation imprint
Author(s): Lei Wang; Wen Liu; Yiwen Zhang; Fei Qiu; Dingli Wang; Ning Zhou; Zhimou Xu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein, temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.

Paper Details

Date Published: 22 October 2010
PDF: 5 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765706 (22 October 2010); doi: 10.1117/12.867573
Show Author Affiliations
Lei Wang, Huazhong Univ. of Science and Technology (China)
Wen Liu, Huazhong Univ. of Science and Technology (China)
Accelink Technologies Inc. (China)
Yiwen Zhang, Huazhong Univ. of Science and Technology (China)
Fei Qiu, Huazhong Univ. of Science and Technology (China)
Dingli Wang, Accelink Technologies Inc (China)
Ning Zhou, Accelink Technologies Inc (China)
Zhimou Xu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems

© SPIE. Terms of Use
Back to Top