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Proceedings Paper

6-inch circle template fabrication for patterned media
Author(s): Kimio Itoh; Morihisa Hoga; Nobuhito Toyama
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Paper Abstract

Nanoimprint lithography (NIL) is one promising candidate for fabricating a patterned media to be used in the next generation of hard disk drives (HDD). It is expected that the pitch, characterizing the feature size of the media will become as small as about 40-50 nm for discrete-track recording (DTR) in 2011 or 2012. There are two major issues, one is fine groove formation and the other is long e-beam writing time. Writing time is estimated more than one week if we use ZEP520A-resist. To solve these problems, master template fabrication processes using combination of silicon substrate and new chemically amplified resist (CAR) were demonstrated by using a rotary stage e-beam writer and 50 nm pitch DTR patterns. Estimated writing speed is three times higher. Also it was demonstrated that silicon master template can be applicable for J-FIL quartz replica process.

Paper Details

Date Published: 25 September 2010
PDF: 7 pages
Proc. SPIE 7823, Photomask Technology 2010, 78230P (25 September 2010); doi: 10.1117/12.867541
Show Author Affiliations
Kimio Itoh, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Nobuhito Toyama, DNP Corp. USA (United States)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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