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Proceedings Paper

Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm
Author(s): H. Blaschke; W. Riggers; D. Ristau
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Paper Abstract

The paper presents results of investigations in evaporated LaF3-MgF2 and LaF3-AlF3 classical high-reflecting multilayers deposited on super-polished CaF2 substrates. In addition to typical spectroscopic inspections up to the band edge of fluoride substances in the VUV spectral range, the work is dedicated to the determination of laser-induced damage threshold at moderate pulse numbers for the wavelength 193 nm. Further on, dose dependent irradiation tests are performed well below the fluence level of damage onset indicating changes for the spectral transfer functions. These experimental observations are discussed in order to find a correlation to the characteristic damage behavior of both material combinations. In contrast to the standard evaporation process, partial-reflecting fluoride coatings have been deposited under ion-assisted conditions with fluorine gas. Results of damage tests will show excellent performance to high fluence levels.

Paper Details

Date Published: 7 December 2010
PDF: 8 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420I (7 December 2010); doi: 10.1117/12.867257
Show Author Affiliations
H. Blaschke, Laser Zentrum Hannover e.V. (Germany)
W. Riggers, Laseroptik GmbH (Germany)
D. Ristau, Laser Zentrum Hannover e.V. (Germany)
Ctr. of Quantum Engineering and Space-Time Research (Germany)

Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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