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Proceedings Paper

Study of laser induced damage of high reflector at 1064 nm
Author(s): Hongfei Jiao; Xinbin Cheng; Zhengxiang Shen; Bin Ma; Jinlong Zhang; Tao Ding; Pengfei He; Zhanshan Wang
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Paper Abstract

One TiO2/SiO2 high reflector with absorption of 300 ppm and two HfO2/SiO2 high reflectors with absorption of 40 and 4.5 ppm were fabricated using electron beam evaporation method. The influence of average absorption on laser induced damage threshold (LIDT) at 1064 nm of these coatings was studied using r-on-1 test mode. The LIDT of high absorbing TiO2/SiO2 coating is only 6.2 J/cm2 at 3 ns, whereas, two weak absorbing HfO2/SiO2 high reflectors got almost the same LIDT that was over 100 J/cm2 at 3 ns. Then a raster scan test method was employed to find the typical damage morphologies of these coatings with different absorption level. For TiO2/SiO2 high reflector with high average absorption, the representative damage morphologies are shallow pits that were probably caused by absorbing centers. However, for HfO2/SiO2 high reflectors with low average absorption, the dominant damage morphologies are micrometer-sized nodules ejected pits and the delamination initiating from the pits. The absorption of HfO2/SiO2 coatings is low enough to have minor influence on the laser induced damage.

Paper Details

Date Published: 30 November 2010
PDF: 10 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784205 (30 November 2010); doi: 10.1117/12.867241
Show Author Affiliations
Hongfei Jiao, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Xinbin Cheng, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Zhengxiang Shen, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Bin Ma, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Jinlong Zhang, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Tao Ding, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Pengfei He, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)


Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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