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Proceedings Paper

The removal function of edge effect and amending with dwell time function
Author(s): Wei-Jie Deng; Li-gong Zheng; Xiao-kun Wang; Xiao Luo; Feng Zhang
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Paper Abstract

Computer Controlled Optical Surfacing (CCOS) is widely used for making optical aspheric mirrors. In the practical fabrication, edge effect is an important problem which restricts the fabrication efficiency and accuracy seriously. In this paper, the edge effect is solved by working out the edge removal function and compensate with dwell time function. Skin Model is used to describe the pressure distribution when the tool hangs over the work-piece. The calculation model of edge removal function is derived from Skin Model theoretically. A removal function experiment is completed. The difference between the theoretical model and the experiment results is less than 5%. It means that the calculation model is suit for the practical fabrication. Than the dwell time is solved with edge effect compensation by matrix-based algorithm. In the end, actual experiment was done to validate the edge effect compensation method.

Paper Details

Date Published: 7 October 2010
PDF: 10 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552C (7 October 2010); doi: 10.1117/12.867228
Show Author Affiliations
Wei-Jie Deng, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Li-gong Zheng, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiao-kun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiao Luo, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Feng Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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