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Proceedings Paper

LIDT of HfO2/SiO2 HR films by different test modes at 1064nm and 532nm
Author(s): Bin Ma; Tao Ding; Hongfei Jiao; Gang Zhou; Zhengxiang Shen; Xinbin Cheng; Jinlong Zhang; Huasong Liu; Yiqin Ji; Pengfei He; Zhanshan Wang
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Paper Abstract

In order to evaluate the laser induced damage threshold (LIDT) of our HfO2/SiO2 high reflectance films prepared by reactive electron beam evaporation process at 1064nm and 532nm, the four popular test methods are performed according to the ISO 11254 and other relevant standards. The improvement of laser conditioning effect and influence of cumulative effect have been studied and estimated during the tests by comparing the deviations of the thresholds along the damage probability curves and relationship between the thresholds and the pulses number. Moreover, the details are carefully inspected during raster scan especially at 1064nm with all the >2μm nodules and damage sites marking and recording, then the ejection probability and growth rate of nodules are given. Note that attention should be paid to the submicron absorbing particulates at 532nm which are probable to trigger the damage.

Paper Details

Date Published: 2 December 2010
PDF: 11 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420E (2 December 2010); doi: 10.1117/12.867226
Show Author Affiliations
Bin Ma, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Tao Ding, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Hongfei Jiao, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Gang Zhou, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Zhengxiang Shen, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Xinbin Cheng, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Jinlong Zhang, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)
Huasong Liu, Tongji Univ. (China)
Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tianjin Jinhang Institute of Technical Physics (China)
Pengfei He, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Shanghai Key Lab. of Special Artificial Microstructure Materials and Technology (China)


Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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