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Proceedings Paper

Effects of electric field distribution and pulse duration on the ultra-short pulse laser damage resistance of laser coatings
Author(s): Shunli Chen; Meiping Zhu; Dawei Li; Hongbo He; Yuanan Zhao; Jianda Shao; Zhengxiu Fan
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Paper Abstract

Two kinds of multilayer HfO2/SiO2 high reflectors, the "standard" and "modified" designs with different electric field distribution, were investigated in this paper. A femtosecond laser system was applied to test the laser-induced damage thresholds (LIDTs) of these two kinds of coatings. Optical microscopy and scanning electron microscopy (SEM) were employed to study the morphology and structural information of the damage site. Compared the LIDTs of "modified" design with that of "standard" design, it was found that reducing electric field at layer interface could improve the LIDTs of multilayer coatings. Furthermore, the improvement efficiency showed certain dependency on the pulse width. Diverse roles of several conceivable ionization mechanisms played in the damage process were discussed to explain the relation between the LIDTs and electric field distribution.

Paper Details

Date Published: 29 November 2010
PDF: 8 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420D (29 November 2010); doi: 10.1117/12.867225
Show Author Affiliations
Shunli Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Dawei Li, Shanghai Institute of Optics and Fine Mechanics (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Yuanan Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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