Share Email Print

Proceedings Paper

Evaluation of metrology capabilities of mask inspection equipment
Author(s): T. Touya; S. Tamamushi; N. Takamatsu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The demand for aggressive image placement (IP) accuracy and the CD uniformity of Mask is being increasingly accelerated by DPT deployment. It is becoming feasible to improve CD accuracy, by feeding back CD information to mask writer, or by feed-forwarding CD information on a mask to lithography scanner. Moreover, it is also becoming realistically available to improve position accuracy, by feeding back Mask IP information to mask writer. It was necessary to prepare certain special pattern to measure CD and IP, and to measure the pattern with a conventional metrology tool, requiring long measurement time in the event the number of measurement points is large as can be seen with the lately emerging advanced masks. We are developing a function to acquire both CD information and IP information on the mask at the same time the image data acquired are analyzed by mask defect inspection equipment, so that no special pattern may be needed and no additional measurement time is required. We will report on the result of obtaining IP data of a product-like pattern using this function.

Paper Details

Date Published: 26 May 2010
PDF: 11 pages
Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480O (26 May 2010); doi: 10.1117/12.867221
Show Author Affiliations
T. Touya, NuFlare Technology Inc. (Japan)
S. Tamamushi, NuFlare Technology Inc. (Japan)
N. Takamatsu, NuFlare Technology Inc. (Japan)

Published in SPIE Proceedings Vol. 7748:
Photomask and Next-Generation Lithography Mask Technology XVII
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top