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Proceedings Paper

Study on the preparation of a high diffraction efficiency Dammann grating with subwavelength structure
Author(s): Yanbing Leng; Lianhe Dong; Yanjun Sun
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Paper Abstract

Based on the couple-wave analysis theory and the genetic algorithm, a high diffraction efficiency dammann grating with subwavelength structure has been designed and prepared. The array number of diffractive spots is 9 and the feature size achieves 0.92μm. The diffraction efficiency of the grating reaches 92%. By using Electron Beam Direct Writing and Reactive Ion Etching, we patterned the subwavelength structure on the silica. The experimental results show that the subwavelength structure with nanometer resolution can be patterned by computer controlled electron beam scanning exposure. In reactive ion etching, the etching rate and the grating line-shape can be affected by radio frequency (RF) power, system pressure and gas flow. When there are pressure of 6 pa and gas flow of 35cm3/min steadily, etching rate increases nonlinearly with RF power and reaches the peak at 350W. While RF power is higher than 350W, etching rate descends with its increasing and surfaces of grating groove become rough and burned deformed easily. When the RF power and gas flow are steadily, etching rate increases with system pressure reaches the peak at 13Pa, then descends. On the contrary, when the RF power and system pressure are steadily, etch rate decreases with the increase of the gas flow. This paper also analyzes the linewidth error in Electron Beam Direct Writing.

Paper Details

Date Published: 6 October 2010
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 765524 (6 October 2010); doi: 10.1117/12.867091
Show Author Affiliations
Yanbing Leng, Changchun Univ. of Science and Technology (China)
Lianhe Dong, Changchun Univ. of Science and Technology (China)
Yanjun Sun, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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