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Proceedings Paper

Inhibition of contamination laser induced damage to optical substrates
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Paper Abstract

We have characterized the thresholds for contamination laser induced damage (C-LID) process using toluene as a model contaminant by varying oxygen and toluene concentrations. In the presence of 300 ppm toluene and nitrogen, the damage threshold is (7.8 ± 1.9) × 103 laser pulses, in synthetic air the damage threshold is (18.0 ± 2.1) × 103 laser pulses. We have found several high vapor pressure molecules that effectively inhibit the (C-LID) process and greatly extend the lifetime of fused silica optics under high power laser irradiation. With the addition of ~4000 ppm of water, methanol or ethanol, the lifetime exceeds 1 × 106 laser pulses with no damage observed. Possible mechanisms are discussed.

Paper Details

Date Published: 2 December 2010
PDF: 7 pages
Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784229 (2 December 2010); doi: 10.1117/12.867025
Show Author Affiliations
Bruce H. Weiller, The Aerospace Corp. (United States)
Jesse D. Fowler, The Aerospace Corp. (United States)
Randy M. Villahermosa, The Aerospace Corp. (United States)

Published in SPIE Proceedings Vol. 7842:
Laser-Induced Damage in Optical Materials: 2010
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M. J. Soileau, Editor(s)

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