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Proceedings Paper

Theoretical analysis and experimental study of material removal characteristics in ion beam figuring process
Author(s): Yifan Dai; Wenlin Liao; Shanyong Chen; Lin Zhou; Xuhui Xie
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Paper Abstract

Based on the Sigmund sputtering theory, the material removal characteristics in ion beam figuring process are analyzed. The analysis shows that the footprint of beam removal function and the removal rate vary with different incidence angles, which is validated by experiments on small fused silica samples. These material removal characteristics are valuable in ion beam figuring process, which could be applied to machining spherical surfaces and aspherical surfaces with simple method.

Paper Details

Date Published: 6 October 2010
PDF: 6 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76550X (6 October 2010); doi: 10.1117/12.866969
Show Author Affiliations
Yifan Dai, National Univ. of Defense Technology (China)
Wenlin Liao, National Univ. of Defense Technology (China)
Shanyong Chen, National Univ. of Defense Technology (China)
Lin Zhou, National Univ. of Defense Technology (China)
Xuhui Xie, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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