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Proceedings Paper

Two-beam reflectance and transmittance measurement for "Shenguang-II" facility
Author(s): Jie Miao; Pengqian Yang; Baoqiang Zhu; Janqiang Zhu
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Paper Abstract

This presentation will propose a two-beam system of reflectance, transmittance and coating uniformity measurement, which is specialized for the large-aperture coated mirrors used on "SG-II" (short for "Shenguang-II" ) facility. The largeaperture (up to 400 mm × 400 mm) mirrors required for "SG-II" facility have very stringent specifications. The most essential specifications of them are reflectance, transmittance, and coating uniformity especially for large-aperture mirrors. The two-beam system that we introduce has two light sources, which can solve large-aperture problems quite well. One is 1053nm infrared laser for measurement; another is 532nm visible laser for both pre-measurement and collimation. Mirrors under test are collimated with the help of CCD in the first light path (532nm laser). Moreover, the light beam is expanded to a suitable size, which is particularly useful for imaging pre-measurement. The second light beam from 1053nm laser is specialized for tested high power laser wavelength requirement, without spectral resolution problems of those photometers. It is designed for high precision single point measurement. The point-measuring path of the full aperture can be selected by the operator, referring to the first imaging pre-measurement result. The two-beam system we proposed has a more efficient method with the first beam. And it is also quite a good resolution to highly accurate full-aperture measurement to large-aperture mirrors of "SG-II" facility, since it takes less time than full-aperture scanning methods and it has better resolution and accuracy than normal imaging methods.

Paper Details

Date Published: 13 October 2010
PDF: 6 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76564K (13 October 2010); doi: 10.1117/12.866832
Show Author Affiliations
Jie Miao, Shanghai Institute of Optics and Fine Mechanics (China)
Pengqian Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Baoqiang Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Janqiang Zhu, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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