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Proceedings Paper

Nanolithography in the evanescent near-field by using gain-assisted meta-materials system
Author(s): Yong Yang; Wei Yan; Jian Wang; Yanli Li; Lixin Zhao; Song Hu; Zhan Li
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Paper Abstract

Surface Plasmon polaritons are electromagnetic waves that propagate along the surface of a conductor, usually a metal. It is shown that the gain-assisted metamaterial can compensate for the intrinsic absorption loss in metal. In this paper, the propagation of surface plasmon polaritons on gain-assist metamaterial system is investigated. As an example, nanolithography has been considered by using optical proximity exposure in the evanescent near field of gain-assisted metamaterial layer. The evanescent waves carried the detailed information of the object which was defined by the high space frequency of the mask. With the enhancement of surface plasmon polaritons and gain-assisted metamaterials system, the evanescent waves can be propagated to a relatively far distance. Numerical computations by finite element analysis shows that better optimization of the gain-assisted metamaterials system can further improve the resolution. Experiments will be developed to prove the simulation by using a modified i-line aligner. The computation result shows it will be an alternative nanolithography technique for the next generation lithography.

Paper Details

Date Published: 22 October 2010
PDF: 6 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571C (22 October 2010); doi: 10.1117/12.866808
Show Author Affiliations
Yong Yang, Institute of Optics and Electronics (China)
Wei Yan, Institute of Optics and Electronics (China)
Jian Wang, Institute of Optics and Electronics (China)
Yanli Li, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Zhan Li, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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