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Proceedings Paper

Center removal amount control of magnetorheological finishing process by spiral polishing way
Author(s): Yajun Wang; Jianguo He; Fang Ji; Wen Huang
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Paper Abstract

Spiral polishing is a traditional process of computer-controlled optical surfacing. However, the additional polishing amount is great and the center polishing amount is difficult to control. At first, a simplified mathematics model is presented for magnetorheological finishing, which indicates that the center polishing amount and additional polishing amount are proportional to the length and peak value of magnetorheological finishing influence function, and are inversely proportional to pitch and rotation rate of spiral track, and the center polishing amount is much bigger than average polishing amount. Secondly, the relationships of "tool feed way and center polishing amount", "spiral pitch and calculation accuracy of influence matrix for dwell time function solution", "spiral pitch and center polishing amount" and "peak removal rate, dimensions of removal function and center removal amount" are studied by numerical computation by Archimedes spiral path. It shows that the center polishing amount is much bigger in feed stage than that in backhaul stage when the head of influence function is towards workpiece edge in feeding; and the bigger pitch, the bigger calculation error of influence matrix elements; and the bigger pitch, the smaller center polishing amount, and the smaller peak removal rate and dimensions of removal function, the smaller center removal amount. At last, the polishing results are given, which indicates that the center polishing amount is acceptable with a suitable polishing amount rate of feed stage and backhaul stage, and with a suitable spiral pitch during magnetorheological finishing procedure by spiral motion way.

Paper Details

Date Published: 6 October 2010
PDF: 9 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552Q (6 October 2010); doi: 10.1117/12.866723
Show Author Affiliations
Yajun Wang, China Academy of Engineering Physics (China)
Jianguo He, China Academy of Engineering Physics (China)
Fang Ji, China Academy of Engineering Physics (China)
Wen Huang, China Academy of Engineering Physics (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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