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Proceedings Paper

Focusing and leveling in dual stage lithographic system
Author(s): Jinlong Li; Lixin Zhao
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Paper Abstract

As a key technology in lithographic system, the wafer stage is a six-degree of freedom and long stroke movement platform whose movement and positioning accuracy are up to nano-scale, and it involves precision machinery, precision measurement, automation and materials science in one complex system. In the lithography process, the function of the stage includes: wafer transmission, alignment, focusing and leveling, scanning exposure and so on. Positioning accuracy of the stage directly affects the alignment accuracy, as well as focusing accuracy, thus affecting the improvement of lithographic resolution as a whole. For the rapid increasing in chip integration, the chip makers acquire higher throughput of the lithographic system, under the demand, there has been dual-stage technology, i.e., in one lithographic system, there are two wafer stages, which separately locates at measurement position and exposure location. They run independently and in parallel, when the measurement and the exposure are completed, the two stages exchange their positions and functions. The dual stage technology not only significantly increases the yield, but also improves the measurement accuracy in focus detection. Focusing and leveling in dual stage is different from that in single stage. In this paper, combination of grating-based focus detection and dual stage technology is used to introduce leveling and focusing in dual-stage system. The principle of focus detection, the way for height information transforming to the wafer leveling data, as well as the servo of focusing and leveling at exposure location are carried out in detail.

Paper Details

Date Published: 22 October 2010
PDF: 7 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571H (22 October 2010); doi: 10.1117/12.866722
Show Author Affiliations
Jinlong Li, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Lixin Zhao, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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