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Proceedings Paper

Research on the relationship between the CVD ZnSe turning surface defects and the material micro-characteristic
Author(s): Weihao Li; Hongzhi Zhang; Yi Tong; Yiqin Ji; Zhengxiang Shen; Lishuan Wang; Fang Wang; Qingguang Bai
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Paper Abstract

The relationship between CVD ZnSe material characteristics and turning surface characteristics was studied in this paper. By using metallographic microscope, scanning electron microscope, X-ray energy spectrometer and 3D surface profiler, the raw material's section and turning surface of CVD ZnSe were observed; the origin of little flaws and annular patterns on turning surface was analyzed. The results show: the defects of CVD ZnSe raw material cause the turning surface defects, some become little pits and some are filled up by chips directly; the polycrystalline structure of CVD ZnSe causes the annular patterns on turning surface, the annular patterns caused by polycrystalline structure of CVD ZnSe can be eliminated by setting appropriate cutting parameters and tool parameters, and the Ra value of smooth turning surface roughness without annular patterns can be under 3nm. The paper establishes the technical foundations for further explore of the turning surface quality control methods.

Paper Details

Date Published: 7 October 2010
PDF: 7 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552H (7 October 2010); doi: 10.1117/12.866659
Show Author Affiliations
Weihao Li, Tianjin Jinhang Institute of Technical Physics (China)
Hongzhi Zhang, Tianjin Jinhang Institute of Technical Physics (China)
Yi Tong, Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tianjin Jinhang Institute of Technical Physics (China)
Zhengxiang Shen, Tongji Univ. (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Fang Wang, Tianjin Jinhang Institute of Technical Physics (China)
Qingguang Bai, Tianjin Jinhang Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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