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Proceedings Paper

Analysis of titanium and vanadium oxide thin film by method of reactive co-sputtering
Author(s): Tao Wang; Yadong Jiang; He Yu
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Paper Abstract

A systematic simulation based on Berg's model and theoretic study of co-reactive sputtering of titanium and vanadium targets is presented. It enables one to predict the hysteresis effect and intermediate composition of the deposited film as a function of different targets current in the co-reactive sputtering process. With this approach, it is possible to obtain different stoichiometry of thin film by choosing different ratio of vanadium target current to titanium target current. In this case, the material composition in the thin film with respect to the fraction of these two targets current can be optimized. Finally, the deposition rate of co-reactive sputtering as a function of total sputtering rate of two metal material atoms is also described.

Paper Details

Date Published: 22 October 2010
PDF: 5 pages
Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76581O (22 October 2010); doi: 10.1117/12.866619
Show Author Affiliations
Tao Wang, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)
He Yu, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7658:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology

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