Share Email Print
cover

Proceedings Paper

The spectral adaptation applied to image color appearance model
Author(s): Huimin Yang; Weiping Yang; Chunwen Guo; Xiangsheng Wu; Hongning Li; Aili Dou; Fengxiang Bai
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The major aim of Color Appearance Model is trying to resolve the problem of high faithful color reproduction under different viewing conditions, which is one of the main mathematical methods fulfilling the cross-media color production. Currently used Color Appearance Model (CAM) based on von Kries chromatic adaptation transform, that is, CAM acts upon chromatic signals such as tristimulus values rather than spectral characteristics. The spectral adaptation model introduced by Fairchild in 2006 based on the spectral reflectance factor of stimulus and the spectral power distribution function of light source. The new way models the vision phenomenon with no requirement for the chromatic processing. Munsell color chips are used as basic data. Spectral adaptation model and CIELAB color space are employed to predict corresponding color appearance attributes. Then the comparison to CAT02 chromatic adaptation transform is also made. The result shows that spectral adaptation model has a high degree of accuracy in lightness performance, and the relative error is between 2 % and 5 %. But the accuracy of chroma is less than CAT02, and both models have good uniformity in hue performance. Taking the image color appearance model as the carrier, the spectral adaptation model is applied to the image reproduction. The methods are used to model the image with no requirements for the CAT02 chromatic adaptation processing and to use spectral adaptation as pretreatment, then to carry out the chromatic adaptation transformation. Discussion of the advantages and limitations of the model and the practical value in image rendering is also presented.

Paper Details

Date Published: 22 October 2010
PDF: 6 pages
Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76584Q (22 October 2010); doi: 10.1117/12.866455
Show Author Affiliations
Huimin Yang, Yunnan Normal Univ. (China)
Weiping Yang, Yunnan Normal Univ. (China)
Chunwen Guo, Yunnan Normal Univ. (China)
Xiangsheng Wu, Yunnan Normal Univ. (China)
Hongning Li, Yunnan Normal Univ. (China)
Aili Dou, Yunnan Normal Univ. (China)
Fengxiang Bai, Yunnan Normal Univ. (China)


Published in SPIE Proceedings Vol. 7658:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

© SPIE. Terms of Use
Back to Top