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Proceedings Paper

Study on the test of transient ultraviolet spectrum for remote extended area sources with spectrometer
Author(s): Hongguang Li; Hongru Yang
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Paper Abstract

Spectral radiation intensity measurement at ultraviolet wavelengths is important for the material composition analysis of transient extended area light sources. Here we developed transient ultraviolet multi-spectral spectrometer which is utilized to measure relative spectral radiation intensity distributions of remote transient as well as steady-state extended area light sources in the wavelength range (0.22-0.40) μm. Simultaneously the device also shows different spectral radiation intensity distribution curve of the transient radiation source along with time changes. This spectrometer consists of mobile collimation lens, Cassegrain imaging system, grating spectrograph, high speed data acquisition system and computer software. Since ultraviolet spectral radiation is severely absorbed in air transmission, firstly the Cassegrain system which has high reflectance in ultraviolet wavelength range is used to image the extended area light source onto the entrance slit of spectrograph, in order to markedly improve the light gathering power of the device. The spectrograph uses plane blazed grating to disperse spectrums which are focalized as the focal plane for detection by ultraviolet response enhancing array CCD detector. Secondly, to resolve spectrum acquisition problem of nanosecond transient light sources, we adopt CCD drive technology programmed by CPLD and fixed phasic high speed data acquisition method. Finally, the spectral distortion of the spectrograph is reduced by using non-parametric kernel regression de-noising algorithm and convolution algorithm in order to improve the spectral resolving power of the device. So we experimentalize for spectral radiation intensity distributions of remote transient and steady-state extended area light sources, then the uncertainty of measurement results is analyzed.

Paper Details

Date Published: 11 October 2010
PDF: 7 pages
Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 76562Y (11 October 2010); doi: 10.1117/12.866406
Show Author Affiliations
Hongguang Li, Xi'an Institute of Applied Optics (China)
Hongru Yang, Xi'an Institute of Applied Optics (China)


Published in SPIE Proceedings Vol. 7656:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Jose M. Sasian; Libin Xiang; Sandy To, Editor(s)

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