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Proceedings Paper

New exploration of the optical aspherical replication technique
Author(s): Qin Wang; Yuhuan Zhao; Liwei Zhang; Jingchi Yu
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Paper Abstract

From the fundamental of the optical aspherical replication technique, relationship among wave error of the emergent wave surface, the profile accuracy of the substrate and the refractive index difference is discussed. Figure of the relationship between wave error of the emergent wave surface and the profile accuracy of the substrate under the condition of three values of the refractive index difference is shown. Theoretical analysis shows that if requirement of the wave error of the emergent wave surface is not extremely strict and index of the resin is proper, the substrate needn't to be polished. Profile graph of the replica using unpolished substrate is provided, and it is compared with profile graph of the mould. Experimental results show that profile of the replica reflects the mould's figure perfectly. The replica's PV and RMS are respectively 0.167λ and 0.022λ, and they are enough small to meet the profile precision requirement of normal optical system.

Paper Details

Date Published: 7 October 2010
PDF: 5 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76551S (7 October 2010); doi: 10.1117/12.866283
Show Author Affiliations
Qin Wang, Henan Polytechnic Univ. (China)
Yuhuan Zhao, Henan Polytechnic Univ. (China)
Liwei Zhang, Henan Polytechnic Univ. (China)
Jingchi Yu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

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