Share Email Print
cover

Proceedings Paper

Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering
Author(s): Y. Z. Cao; Z. J. Hu; F. L. Yu; T. Sun; S. Dong
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Nanocrystalline silicon dioxide (SiO2) films were prepared on aluminium substrates using medium frequency magnetron sputtering. The surface morphology of SiO2 film on aluminium substrate was observed using atomic force microscopy. The nanohardness and the elastic modulus of the SiO2 film-aluminium system were measured by a nanoindentation technique. Moreover, optical propertie of SiO2 film-aluminium system was investigated. It was found that the composition of silicon dioxide films varies from nearly pure Si, SiO to SiO2, controlled by O2 flow rate. The reflection index of nanocrystalline SiO2 film-aluminium system is accord with the mixture rule. All SiO2 films are transparent and the transmittance increases with increasing O2 concentration.

Paper Details

Date Published: 6 October 2010
PDF: 5 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552G (6 October 2010); doi: 10.1117/12.866244
Show Author Affiliations
Y. Z. Cao, Harbin Institute of Technology (China)
Z. J. Hu, Harbin Institute of Technology (China)
F. L. Yu, Harbin Institute of Technology (China)
T. Sun, Harbin Institute of Technology (China)
S. Dong, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yoshiharu Namba; David D. Walker; Shengyi Li, Editor(s)

© SPIE. Terms of Use
Back to Top