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Proceedings Paper

Design of multilayer grating in VUV spectrum by rigorous coupled-wave method
Author(s): Shengnan He; Ying Liu; Huoyao Chen; Keqiang Qiu; Shaojun Fu
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Paper Abstract

The rigorous coupled-wave method (RCWM) is extended to calculate the diffraction efficiency of multilayer grating in spectrum with strong absorption. This paper gives a detailed algorithm analysis of the RCWM, an enhanced, numerically stable transmittance matrix approach applied to homogenous layered media is generalized for multilayer grating structure. In order to calculate in the lossy medium, the wave vector of electric field is redefined. This method is programmed to design multilayer grating which is expected to use on Seya-Namioka synchrotron monochromator in vacuum ultraviolet (VUV) spectrum. The influence on diffraction efficiency caused by grating profile and multilayer stack is analyzed theoretically. The diffraction efficiencies of well-designed multilayer gratings are all greater than 10% in 50-110nm region, and they are about two to three times higher than that of the single metallic layer grating which is being used on Seya-Namioka monochromator now.

Paper Details

Date Published: 7 October 2010
PDF: 8 pages
Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76551O (7 October 2010); doi: 10.1117/12.866135
Show Author Affiliations
Shengnan He, Univ. of Science and Technology of China (China)
Ying Liu, Univ. of Science and Technology of China (China)
Huoyao Chen, Univ. of Science and Technology of China (China)
Keqiang Qiu, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7655:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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