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Proceedings Paper

Study on controlling the profile of holographic ion beam etching gratings
Author(s): Quan Liu; Hai-bin Wang; Jian-hong Wu; Peng Sun; Guo-lin Qian; Dan Wang
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Paper Abstract

To alleviate the difficulty in controlling the profile of the photoresist grating mask, advanced segment motion algorithm has been applied to simulate and analyze the evolution of the surface contour in ion beam etching. The simulation indicates that the combination of ion beam etching and reactive ion beam etching can effectively control the duty cycle of the holographic ion beam etching gratings. This has also been validated by the fabrication of four kinds of gratings with different periods (6.66μm, 3.33μm, 2μm, 1μm). This finding contributes to the fabrication of the holographic ion beam etching gratings because it helps to simplify the holographic exposure and development.

Paper Details

Date Published: 22 October 2010
PDF: 6 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765719 (22 October 2010); doi: 10.1117/12.866035
Show Author Affiliations
Quan Liu, Soochow Univ. (China)
Hai-bin Wang, Soochow Univ. (China)
Jian-hong Wu, Soochow Univ. (China)
Peng Sun, Soochow Univ. (China)
Guo-lin Qian, Soochow Univ. (China)
Dan Wang, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems

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