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Proceedings Paper

High performance photomask technology with the advanced binary film
Author(s): Koji Murano; Kosuke Takai; Kunihiro Ugajin; Machiko Suenaga; Takeharu Motokawa; Masato Saito; Tomotaka Higaki; Osamu Ikenaga; Hidehiro Watanabe
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Paper Abstract

A new photomask technology with the Advanced Binary Film (ABF) by HOYA has been established. The film of relatively low thickness is expected to show the best lithography performance. The simple film structure of thin film of chemically amplified resist, as a mask layer for etching, on the thin ABF film enables us to obtain sub-50nm small features in a photomask. The thinness of the film also helps to avoid pattern collapse in cleaning steps. The photomask with ABF expecting the best currently available lithography performance shows the best achievable durability for use in ArF lithography process steps and the best attainable feasibility in the fabrication process steps for leading edge photomasks.

Paper Details

Date Published: 24 September 2010
PDF: 9 pages
Proc. SPIE 7823, Photomask Technology 2010, 78232W (24 September 2010); doi: 10.1117/12.866015
Show Author Affiliations
Koji Murano, Toshiba Corp. (Japan)
Kosuke Takai, Toshiba Corp. (Japan)
Kunihiro Ugajin, Toshiba Corp. (Japan)
Machiko Suenaga, Toshiba Corp. (Japan)
Takeharu Motokawa, Toshiba Corp. (Japan)
Masato Saito, Toshiba Corp. (Japan)
Tomotaka Higaki, Toshiba Corp. (Japan)
Osamu Ikenaga, Toshiba Corp. (Japan)
Hidehiro Watanabe, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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