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Proceedings Paper

Design and simulation for the bifocal microlens in thick film lithography
Author(s): Xionggui Tang; Rongguo Lu; Jinkun Liao; Heping Li; Lin Zhang; Yongzhi Liu
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Paper Abstract

The bifocal microlens are novel optical components, which have the capability of producing two focal points along optical axis. They have potential application in readout of dual-layer disks, optical tweezer, optical coherence tomography and microfluidic system. In this paper, the design for the bifocal microlens has been presented. The distortion of the pattern transfer process in the thick film lithography has been analyzed. The modified grayscale mask method has been introduced to compensate the distortion of the pattern transfer process. The simulation for fabrication of the bifocal microlens in the thick film lithography has been performed, which shows that the simulated profile is closely consistent with the designed one. Through our proposed method, the bifocal microlens with high profile quality can be obtained, and consequently this can greatly improve its optical performance. Furthermore, the fabrication process is relatively easy and the cost is low, which is favorable to the future application of the bifocal microlens.

Paper Details

Date Published: 22 October 2010
PDF: 7 pages
Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571S (22 October 2010); doi: 10.1117/12.865995
Show Author Affiliations
Xionggui Tang, Univ. of Electronic Science and Technology of China (China)
Rongguo Lu, Univ. of Electronic Science and Technology of China (China)
Jinkun Liao, Univ. of Electronic Science and Technology of China (China)
Heping Li, Univ. of Electronic Science and Technology of China (China)
Lin Zhang, Univ. of Electronic Science and Technology of China (China)
Yongzhi Liu, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7657:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; Sen Han; Masaomi Kameyama; Song Hu, Editor(s)

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