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Proceedings Paper

The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering
Author(s): Yongfeng Ju; Zhiming Wu; Yonglong Qiu; Lin Li; Yadong Jiang
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Paper Abstract

In this investigation, a novel heat-sensitive material titanium oxide (TiOx) thin film was deposited on well cleaned K9 glass substrates by d.c. reactive magnetron sputtering from a metallic titanium target in an Ar + O2 gas mixture. In order to obtain proper TiOx thin films, deposition parameters should be properly controlled. In our system, TiOx thin films were obtained at different substrate temperature while total pressure and oxygen partial pressure were kept at 1 Pa and 0.6 Pa, d.c. power of 100 W, and the deposition time was adjusted in order to deposit thin films with a constant thickness close to 200 nm. The crystalline structure was characterized by X-ray diffraction (XRD) analysis and the results show that all the deposited films have an amorphous structure. In this paper, we have mainly investigated the dependence of electrical and optical properties of the reactively sputtered TiOx thin films on the different substrate temperature during the sputtering process, i.e., as the K9 glass substrate temperature increases from 100 °C to 250°C, the sheet resistance Rs of TiOx thin films is ranged from 305 kΩ/square to 36 kΩ/square, temperature coefficient of resistance (TCR) value up to -2.12 %/K is obtained, optical band gap decreases from 3.34 eV to 3.28 eV. Through the analysis and discussion of the above experimental data, we could obtain the conclusion that the variation in substrate temperature during the sputtering deposition plays a considerable important role in the electrical and optical properties of all the deposited films.

Paper Details

Date Published: 28 October 2010
PDF: 6 pages
Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76584K (28 October 2010); doi: 10.1117/12.865917
Show Author Affiliations
Yongfeng Ju, Univ. of Electronic Science and Technology of China (China)
Zhiming Wu, Univ. of Electronic Science and Technology of China (China)
Yonglong Qiu, Univ. of Electronic Science and Technology of China (China)
Lin Li, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7658:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

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