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Proceedings Paper

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000
Author(s): Takashi Kamikubo; Takayuki Ohnishi; Shigehiro Hara; Hirohito Anze; Yoshiaki Hattori; Shuichi Tamamushi; Shufeng Bai; Jen-Shiang Wang; Rafael Howell; George Chen; Jiangwei Li; Jun Tao; Jim Wiley; Terunobu Kurosawa; Yasuko Saito; Tadahiro Takigawa
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Paper Abstract

In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

Paper Details

Date Published: 29 September 2010
PDF: 10 pages
Proc. SPIE 7823, Photomask Technology 2010, 782331 (29 September 2010); doi: 10.1117/12.865822
Show Author Affiliations
Takashi Kamikubo, NuFlare Technology, Inc. (Japan)
Takayuki Ohnishi, NuFlare Technology, Inc. (Japan)
Shigehiro Hara, NuFlare Technology, Inc. (Japan)
Hirohito Anze, NuFlare Technology, Inc. (Japan)
Yoshiaki Hattori, NuFlare Technology, Inc. (Japan)
Shuichi Tamamushi, NuFlare Technology, Inc. (Japan)
Shufeng Bai, Brion Technologies, Inc. (United States)
Jen-Shiang Wang, Brion Technologies, Inc. (United States)
Rafael Howell, Brion Technologies, Inc. (United States)
George Chen, Brion Technologies, Inc. (United States)
Jiangwei Li, Brion Technologies, Inc. (United States)
Jun Tao, Brion Technologies, Inc. (United States)
Jim Wiley, Brion Technologies, Inc. (United States)
Terunobu Kurosawa, Brion Technologies KK (Japan)
Yasuko Saito, Brion Technologies KK (Japan)
Tadahiro Takigawa, Brion Technologies KK (Japan)

Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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