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Proceedings Paper

An objective assessment method of digital image mosaic artifacts visibility based on visual perception
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Paper Abstract

The difference of illumination between to-be-mosaicked images will cause mosaic artifacts when digital images are mosaicked. An objective assessment method of digital images mosaic artifacts visibility based on human visual perception has been studied in this paper. The process of the method are as follows; 1) the gradient errors image is obtained according to the to-be-mosaicked images, 2) the just noticeable difference (JND) of reference image is derived by considering the human visual frequency sensitivity, the brightness mask effects and texture mask effects on visual resolution comprehensively; 3) the mosaic artifacts image which is perceptible visually can be acquired by subtracting the JND threshold values from the wavelet coefficients of gradient errors image in wavelet domain. The mosaic artifacts visibility (MAV) of digital image is constructed to use as an objective assessment index of image stitching seam visibility by considering the average value and information entropy of the mosaic artifacts image comprehensively. The experiment indicates that the objective assessment results of digital image mosaic artifacts visibility by MAV index are consistent with those of the subjective perceptual method basically.

Paper Details

Date Published: 22 October 2010
PDF: 8 pages
Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 765843 (22 October 2010); doi: 10.1117/12.865726
Show Author Affiliations
Hongsheng Yu, Beijing Institute of Technology (China)
Huangshi Institute of Technology (China)
Weiqi Jin, Beijing Institute of Technology (China)
Xiusheng Liu, Huangshi Institute of Technology (United States)


Published in SPIE Proceedings Vol. 7658:
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

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