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Proceedings Paper

Multi-shaped e-beam technology for mask writing
Author(s): Juergen Gramss; Arnd Stoeckel; Ulf Weidenmueller; Hans-Joachim Doering; Martin Bloecker; Martin Sczyrba; Michael Finken; Timo Wandel; Detlef Melzer
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Paper Abstract

Photomask lithography for the 22nm technology node and beyond requires new approaches in equipment as well as mask design. Multi Shaped Beam technology (MSB) for photomask patterning using a matrix of small beamlets instead of just one shaped beam, is a very effective and evolutionary enhancement of the well established Variable Shaped Beam (VSB) technique. Its technical feasibility has been successfully demonstrated [2]. One advantage of MSB is the productivity gain over VSB with decreasing critical dimensions (CDs) and increasing levels of optical proximity correction (OPC) or for inverse lithography technology (ILT) and source mask optimization (SMO) solutions. This makes MSB an attractive alternative to VSB for photomask lithography at future technology nodes. The present paper describes in detail the working principles and advantages of MSB over VSB for photomask applications. MSB integrates the electron optical column, x/y stage and data path into an operational electron beam lithography system. Multi e-beam mask writer specific requirements concerning the computational lithography and their implementation are outlined here. Data preparation of aggressive OPC layouts, shot count reductions over VSB, data path architecture, write time simulation and several aspects of the exposure process sequence are also discussed. Analysis results of both the MSB processing and the write time of full 32nm and 22nm node critical layer mask layouts are presented as an example.

Paper Details

Date Published: 24 September 2010
PDF: 9 pages
Proc. SPIE 7823, Photomask Technology 2010, 782309 (24 September 2010); doi: 10.1117/12.865708
Show Author Affiliations
Juergen Gramss, Vistec Electron Beam GmbH Jena (Germany)
Arnd Stoeckel, Vistec Electron Beam GmbH Jena (Germany)
Ulf Weidenmueller, Vistec Electron Beam GmbH Jena (Germany)
Hans-Joachim Doering, Vistec Electron Beam GmbH Jena (Germany)
Martin Bloecker, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Martin Sczyrba, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Michael Finken, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Timo Wandel, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Detlef Melzer, EQUIcon GmbH Jena (Germany)


Published in SPIE Proceedings Vol. 7823:
Photomask Technology 2010
M. Warren Montgomery; Wilhelm Maurer, Editor(s)

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